@article{Janjua_Robinson_2010, title={ELECTRON BEAM IRRADIATION OF C60(OH)10}, volume={47}, url={http://www.thenucleuspak.org.pk/index.php/Nucleus/article/view/871}, abstractNote={The polyhydroxylated fullerene derivative, or fullerol, C60(OH)10, has been investigated as an electron beam resist. Films of fullerol of ∼ 200 nm thickness, were prepared on silicon substrates using spin coating. Upon exposure with electrons at 20 keV the fullerol displayed negative tone resist behaviour after development with isopropyl alcohol:cyclohexanone (1 : 4). The fullerol became insoluble after exposure to a dose of ∼ 10 mC/cm2 for 20 keV electrons.}, number={4}, journal={The Nucleus}, author={Janjua, S. A. and Robinson, A.}, year={2010}, month={Oct.}, pages={267–271} }